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Megasonic Cleaning System
New Megasonic Cleaning System: Model XC1500-ME
Ready for Industry 4.0 applications due to the Ethernet/LAN interface.
New high performance micro processor control
USB- and Ethernet- interface (additional to the RS485)
5“-TFT-display with touchscreen (parameters can be read and modified directly via touchscreen menu)
New power output unit with optimized efficiency factor
The new megasonic cleaning system XC1500-ME with optimized homogenity features for high cleaning efficiency, homogenity and repeatability by using the „permanent frequency autotuning system“ is especially designed for the cleaning of substrates with sub-micron structures.
Additionally the new model XC1500-ME has new features for future requirements (Ethernet-interface for Industrie 4.0, USB-interface, TFT-display with touchscreen menu, …)
Applications:
Etching (H2SO4, H2O2, SC-1, SC-2, …) up to 90°C cleaning of wafers (FR, QDR), masks, LCD-panels, solar cells and other substrates
Features:
Removes particles in the sub-micron area
Gentle cleansing
Automatized frequency adjustment for an optimal cleaning result
Frequency: 1 MHz
Power Density: up to 5 W/cm²
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