For effective drying of wafers and other substrates
after wet cleaning process by centrifugal force.
Standalone or fullautomated integration type available.
Maximum throughput per run:
100 pieces 6″ – wafer (4 cassettes)
or
50 pieces 8″ – wafer (2 cassettes)
Maximum revolutions: 1000 rpm
or
26 pieces 12″ – wafer (2 cassettes)
at max.800 rpm
Material: electropolished stainless steel